Ion Sources
Our ion source portfolio is built around two core technology families: Multicusp Ion Sources for high-current production of protons and light ions, and ECR Ion Sources for generating stable beams of highly charged ions. Each family is available in configurations tailored to the needs of research, medical, industrial, and commercial accelerator applications.
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2 families of ion sources
Family
ECR Ion Sources
The ECR ion source delivers high beam currents of 30 mA or greater for monocharged (1+) gaseous ions. Microwave-driven plasma generation provides excellent operational stability, with beam-current variation as low as ±1% over 24 hours. The absence of a filament reduces routine maintenance requirements and supports long service intervals, making the source well suited for continuous research and industrial operation.
- 2.45 GHz ECR Ion Source
- 2.45 GHz ECR Ion Source, Turnkey System
Family
Multicusp Ion Sources
Multicusp ion sources use magnetic confinement to produce high-quality positive or negative ion beams across a wide range of applications. The technology is particularly well suited for accelerator injection, neutron generation, isotope production, and ion implantation.
- Multicusp Ion Source, Turnkey System
- Multicusp Negative Ion Source
- Multicusp Positive Ion Source
- Multicusp Positive/Negative Ion Source
- Multicusp RF Ion Source